The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Jan. 19, 2022
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Tsiao-Chen Wu, Hsinchu County, TW;
Pei-Cheng Hsu, Taipei, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G03F 1/80 (2012.01); G03F 1/40 (2012.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 1/40 (2013.01); G03F 1/80 (2013.01);
Abstract
The prevent disclosure provides a reflective mask. In some embodiments, the reflective mask includes a substrate, a sp-hybrid carbon layer, a reflective multilayer, and an absorption pattern. The sp-hybrid carbon layer is over the substrate. The reflective multilayer is over the sp-hybrid carbon layer. The absorption pattern is over the reflective multilayer.
Wu, Tsiao-Chen. (2023). Reflective mask and fabricating method thereof (U.S. Patent No. 11630386). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11630386
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile