The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2023

Filed:

Oct. 05, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Ta-Ching Yu, Zhubei, TW;

Shih-Che Wang, Hsinchu, TW;

Shu-Hao Chang, Taipei, TW;

Yi-Hao Chen, New Taipei, TW;

Chen-Yen Kao, Hsinchu, TW;

Te-Chih Huang, Hsinchu, TW;

Yuan-Fu Hsu, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); H01L 21/027 (2006.01); G01N 21/89 (2006.01); G06T 7/00 (2017.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G01N 21/8901 (2013.01); G01N 21/956 (2013.01); G06T 7/0006 (2013.01); H01L 21/0275 (2013.01); H01L 22/24 (2013.01); H01L 22/30 (2013.01); G01N 2021/8825 (2013.01); G06T 2207/10061 (2013.01); H01L 22/12 (2013.01);
Abstract

Embodiments of the present disclosure relate to methods for defect inspection. After pattern features are formed in a structure layer, a dummy filling material having dissimilar optical properties from the structure layer is filled in the pattern features. The dissimilar optical properties between materials in the pattern features and the structure layer increase contrast in images captured by an inspection tool, thus increasing the defect capture rate.


Find Patent Forward Citations

Loading…