The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2023
Filed:
Oct. 27, 2020
Applicants:
Applied Materials, Inc., Santa Clara, CA (US);
National University of Singapore, Singapore, SG;
Inventors:
Yong Wang, Singapore, SG;
Andrea Leoncini, Singapore, SG;
Doreen Wei Ying Yong, Singapore, SG;
Bhaskar Jyoti Bhuyan, San Jose, CA (US);
John Sudijono, Singapore, SG;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02205 (2013.01); C23C 16/45553 (2013.01); H01L 21/02118 (2013.01); H01L 21/0228 (2013.01);
Abstract
Methods of selectively depositing films on substrates are described. A passivation film is deposited on a metal surface before deposition of a dielectric material. Also described is exposing a substrate surface comprising a metal surface and a dielectric surface to a docking precursor to form a passivation film.