The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2023
Filed:
Sep. 17, 2020
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Ying Tang, Brookfield, CT (US);
Bryan C. Hendrix, Danbury, CT (US);
Oleg Byl, Southbury, CT (US);
Sharad N. Yedave, Danbury, CT (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/48 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32412 (2013.01); C23C 14/067 (2013.01); C23C 14/48 (2013.01); H01J 37/32082 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 37/32449 (2013.01);
Abstract
Described are plasma immersion ion implantation methods that use multiple precursor gases, particularly for the purpose of controlling an amount of a specific atomic dopant species that becomes implanted into a workpiece relative to other atomic species that also become implanted into the workpiece during the implantation process.