The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2023

Filed:

Oct. 16, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Xuerang Hu, San Jose, CA (US);

Xinan Luo, San Jose, CA (US);

Qingpo Xi, Fremont, CA (US);

Xuedong Liu, San Jose, CA (US);

Weiming Ren, San Jose, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/225 (2018.01); G01N 21/95 (2006.01); H01J 37/244 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
G01N 23/225 (2013.01); G01N 21/9501 (2013.01); H01J 37/244 (2013.01); H01J 37/32321 (2013.01); H01J 2237/082 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2817 (2013.01);
Abstract

An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.


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