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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11613519 B1

PDFFull Text
Date of Patent:
Mar. 28, 2023

Filed:

Apr. 18, 2016

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Emad Aqad, Northborough, MA (US);

James W. Thackeray, Braintree, MA (US);

James F. Cameron, Brookline, MA (US);

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:

Cantor Colburn LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
C07C 309/17 (2006.01); C07C 309/06 (2006.01); C07C 309/07 (2006.01); C07C 309/12 (2006.01); C07C 309/20 (2006.01); C07C 309/23 (2006.01); C07C 309/42 (2006.01); G03F 7/004 (2006.01); C08F 224/00 (2006.01); G03F 7/039 (2006.01); C07C 303/32 (2006.01);
U.S. Cl.
CPC ...
C07C 309/06 (2013.01); C07C 303/32 (2013.01); C07C 309/07 (2013.01); C07C 309/12 (2013.01); C07C 309/17 (2013.01); C07C 309/20 (2013.01); C07C 309/23 (2013.01); C07C 309/42 (2013.01); C08F 224/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01);
Abstract

A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and Mis an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Find Patent Forward Citations

Aqad, Emad. (2023). Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition (U.S. Patent No. 11613519). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11613519

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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