The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Sep. 11, 2020
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chun-Jui Huang, New Taipei, TW;

Li-Te Lin, Hsinchu, TW;

Pinyen Lin, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/768 (2006.01); H01L 21/311 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76897 (2013.01); H01L 21/0217 (2013.01); H01L 21/02063 (2013.01); H01L 21/31116 (2013.01); H01L 21/76802 (2013.01); H01L 21/76826 (2013.01); H01L 21/76877 (2013.01); H01L 29/66795 (2013.01); H01L 21/02271 (2013.01); H01L 21/31144 (2013.01); H01L 29/6656 (2013.01); H01L 29/66545 (2013.01); H01L 29/66636 (2013.01);
Abstract

A semiconductor device structure is provided. The semiconductor device structure includes a gate stack and a source/drain contact structure formed over a substrate. A first gate spacer is separated the gate stack from the source/drain contact structure and extends above top surfaces of the gate stack and the source/drain contact structure. An insulating capping layer covers the top surface of the gate stack and extends on the top surface of the first gate spacer. A conductive via structure partially covers the top surface of the insulating capping layer and the top surface of the source/drain contact structure. A first insulating layer surrounds the conductive via structure and partially covers the top surface of the source/drain contact structure.


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