The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Jul. 02, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Nobutoshi Terasawa, Hokkaido, JP;

Noriaki Koyama, Yamanashi, JP;

Tomonori Yamashita, Hokkaido, JP;

Takazumi Tanaka, Hokkaido, JP;

Takehiro Kinoshita, Hokkaido, JP;

Fumiaki Nagai, Hokkaido, JP;

Eiji Kikama, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G05B 23/02 (2006.01); G05B 19/418 (2006.01); G06F 17/18 (2006.01);
U.S. Cl.
CPC ...
G05B 23/0205 (2013.01); G05B 19/4184 (2013.01); G06F 17/18 (2013.01); H01L 21/67253 (2013.01); G05B 2219/45031 (2013.01);
Abstract

A substrate processing system includes: an acquiring unit configured to acquire process data of each step when each step included in a predetermined process is executed under different control conditions; an extracting unit configured to divide each step into a first section in which the process data fluctuates and a second section in which the process data is converged, and extract first data belonging to the first section and second data belonging to the second section from the process data; and a monitoring unit configured to monitor the process data by comparing one or both of an evaluation value that evaluates the first data and an evaluation value that evaluates the second data with corresponding upper and lower limit values.


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