The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Oct. 15, 2019
Rohm and Haas Electronic Materials Korea Ltd., Cheonan-si, KR;
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Hye-Won Lee, Cheonan-si, KR;
Min Kyung Jang, Cheonan-si, KR;
Soo Jung Leem, Cheonan-si, KR;
Jae Hwan Sim, Cheonan-si, KR;
Emad Aqad, Northborough, MA (US);
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., Cheonan-si, KR;
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Abstract
A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.