The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2023

Filed:

Oct. 12, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Timothy Vasen, Tervuren, BE;

Marcus Johannes Henricus Van Dal, Linden, BE;

Gerben Doornbos, Kessel-Lo, BE;

Matthias Passlack, Hayward, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/00 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); H01L 23/544 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0003 (2013.01); C23C 16/45525 (2013.01); C23C 16/56 (2013.01); H01L 23/544 (2013.01); H01L 51/003 (2013.01); H01L 51/0048 (2013.01); H01L 51/0508 (2013.01); H01L 2223/54426 (2013.01);
Abstract

Provided herein are wafers that can be used to align carbon nanotubes, as well as methods of making and using the same. Such wafers include alignment areas that have four sides and a surface charge, where the alignment areas are surrounded by areas that have a surface charge of a different polarity. Methods of the disclosure may include depositing and selectively etching a number of hardmasks on a substrate. The described methods may also include depositing a carbon nanotube on such a wafer.


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