The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2023

Filed:

Apr. 24, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yuki Kataoka, Sapporo, JP;

Takehito Watanabe, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G01J 3/443 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); G01J 3/28 (2006.01); G06N 3/12 (2006.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G01J 3/443 (2013.01); H01J 37/32926 (2013.01); H01J 37/32935 (2013.01); H01L 21/67069 (2013.01); H01L 21/67276 (2013.01); G01J 2003/2836 (2013.01); G01J 2003/2859 (2013.01); G06N 3/126 (2013.01); H01J 2237/334 (2013.01);
Abstract

There is provided a learning method. The method includes performing preprocessing on light emission data in a chamber of a plasma processing apparatus, setting a constraint for generating a regression equation representing a relationship between an etching rate of the plasma processing apparatus and the light emission data, selecting a learning target wavelength from the light emission data subjected to the preprocessing, and receiving selection of other sensor data different from the light emission data. The method further includes generating a regression equation based on the set constraint while using, as learning data, the selected wavelength, the received other sensor data, and the etching rate, and outputting the generated regression equation.


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