The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Mar. 21, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventor:
Shifang Li, Pleasanton, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G02B 21/33 (2006.01); G02B 21/14 (2006.01); H01L 21/67 (2006.01); G02B 21/36 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G01N 21/8806 (2013.01); G01N 21/9501 (2013.01); G02B 21/14 (2013.01); G02B 21/33 (2013.01); G02B 21/367 (2013.01); H01L 21/67288 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A review system and operation method directs a beam of light toward a sample on a stage. The sample is a wafer level packaging wafer or a backend wafer. Defect review is performed based on the light reflected from the sample. The review system can use one or more of: a fluid supplied by an immersion subsystem that includes a fluid supply unit and a fluid removal unit; an illumination pattern for differential phase contrast; or ultraviolet or deep ultraviolet wavelengths.