The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Feb. 28, 2020
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventor:

Stanislav Smirnov, Danbury, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7034 (2013.01); G03F 9/7065 (2013.01); G03F 9/7096 (2013.01);
Abstract

A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.


Find Patent Forward Citations

Loading…