The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Aug. 14, 2020
Applicant:

Applied Materials Israel, Ltd., Rehovot, IL;

Inventors:

Assaf Asbag, Alfei Menashe, IL;

Orly Zvitia, Tel-Aviv, IL;

Idan Kaizerman, Meitar, IL;

Efrat Rosenman, Aseret, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06K 9/62 (2022.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G06K 9/6221 (2013.01); G06K 9/6256 (2013.01); G06K 9/6268 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

There are provided system and method of classifying defects in a specimen. The method includes: obtaining one or more defect clusters detected on a defect map of the specimen, each cluster characterized by a set of cluster attributes comprising spatial attributes including spatial density indicative of density of defects in one or more regions accommodating the cluster, each given defect cluster being detected at least based on the spatial density thereof meeting a criterion. The defect map also comprises non-clustered defects. Defects of interest (DOI) are identified in each cluster by performing respective defect filtrations for each cluster and non-clustered defects.


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