The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Jan. 15, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventor:

Maarten Jozef Jansen, Casteren, NL;

Assignee:

ASML Netherland B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02002 (2022.01); G01J 9/02 (2006.01); G01B 11/00 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G01B 9/02001 (2022.01); G01B 9/02015 (2022.01);
U.S. Cl.
CPC ...
G01J 9/0246 (2013.01); G01B 9/02002 (2013.01); G01B 9/02007 (2013.01); G01B 9/02028 (2013.01); G01B 11/002 (2013.01); G03F 7/0002 (2013.01); G03F 7/70725 (2013.01);
Abstract

The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.


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