The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Mar. 08, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Michishige Saito, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 4/11 (2016.01); C23C 4/04 (2006.01); C23C 4/12 (2016.01);
U.S. Cl.
CPC ...
H01J 37/3255 (2013.01); C23C 4/04 (2013.01); C23C 4/11 (2016.01); C23C 4/12 (2013.01); H01J 37/3244 (2013.01); H01J 37/32532 (2013.01); H01J 37/32568 (2013.01);
Abstract
In an exemplary embodiment, an upper electrode is disposed in a processing chamber to face a susceptor and provided with a plate-like member and an electrode part. In an exemplary embodiment, the plate-like member is formed with a gas distribution hole that distributes a processing gas used for a plasma processing. The electrode part is formed in a film shape by thermally spraying silicon onto a surface of the plate-like member where an outlet of the gas distribution hole is formed.