The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

Feb. 26, 2016
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Ping-Yin Liu, Yonghe, TW;

Xin-Hua Huang, Xihu Township, TW;

Lee-Chuan Tseng, New Taipei, TW;

Lan-Lin Chao, Sindian, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/3065 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32834 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32568 (2013.01); H01J 37/32853 (2013.01); H01J 37/32862 (2013.01); H01J 37/32917 (2013.01); H01J 37/32972 (2013.01); H01L 21/3065 (2013.01); H01L 21/67017 (2013.01);
Abstract

An embodiment low contamination chamber includes a gas inlet, an adjustable top electrode, and an adjustable bottom electrode. The low contamination chamber is configured to adjust a distance between the adjustable top electrode and the adjustable bottom electrode in response to a desired density of plasma and a measured density of plasma measured between the adjustable top electrode and the adjustable bottom electrode during a surface activation process. The low contamination chamber further includes an outlet.


Find Patent Forward Citations

Loading…