The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Dec. 10, 2018
Asml Netherlands B.v., Veldhoven, NL;
Mariya Vyacheslavivna Medvedyeva, Eindhoven, NL;
Maria Isabel De La Fuente Valentin, Eindhoven, NL;
Satej Subhash Khedekar, Eindhoven, NL;
Bert Verstraeten, Lommel, BE;
Bastiaan Onne Fagginer Auer, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.