The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2022

Filed:

Mar. 20, 2019
Applicants:

Denso Corporation, Kariya, JP;

Disco Corporation, Tokyo, JP;

Inventors:

Hiroshi Shibata, Tokyo, JP;

Souichi Matsubara, Tokyo, JP;

Jun Koide, Tokyo, JP;

Assignees:

DISCO CORPORATION, Tokyo, JP;

DENSO CORPORATION, Aichi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 51/00 (2006.01); B24B 7/16 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
B24B 51/00 (2013.01); B24B 1/00 (2013.01); B24B 7/16 (2013.01);
Abstract

A wafer grinding method includes grinding a central portion of a wafer by using a plurality of abrasive members annularly arranged so as to form a circular ring, thereby forming a circular recess at the central portion of the wafer and simultaneously forming an annular projection around the circular recess, recognizing a height of a grinding unit after grinding the center by using a height recognizing unit and next storing the height recognized above, and grinding an upper surface of the annular projection to a predetermined value for a height of the annular projection previously set by a setting section as a grinding end height where the grinding of the annular projection by the grinding unit is ended.


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