The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Sep. 06, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Masatoshi Kawakami, Tokyo, JP;

Tsutomu Nakamura, Tokyo, JP;

Hideki Kihara, Tokyo, JP;

Hiroho Kitada, Tokyo, JP;

Hidenobu Tanimura, Tokyo, JP;

Hironori Kusumoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G01J 5/08 (2022.01); H01J 37/32 (2006.01); G01J 5/0875 (2022.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); G01J 5/0875 (2013.01); H01J 37/32192 (2013.01); H01J 37/32522 (2013.01); H01J 37/32807 (2013.01); H01J 37/32935 (2013.01);
Abstract

In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.


Find Patent Forward Citations

Loading…