The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Aug. 23, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Yung-Yao Lee, Hsinchu County, TW;

Chen Yi Hsu, Hsinchu County, TW;

Wei-Hsiang Tseng, Hsinchu County, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01L 21/027 (2006.01); H01L 21/67 (2006.01); H05B 3/06 (2006.01); H05B 1/02 (2006.01); H01L 21/687 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/027 (2013.01); H01L 21/324 (2013.01);
Abstract

A method includes providing a first plate including a first surface, a second surface opposite to the first surface, and a first recess indented from the first surface towards the second surface; providing a semiconductor structure including a third surface, a fourth surface opposite to the third surface, and a first sidewall extending between the third surface and the fourth surface; placing the semiconductor structure over the first plate; and disposing a priming material over the third surface of the semiconductor structure, wherein a peripheral portion of the fourth surface of the semiconductor structure is in contact with the first surface of the first plate upon the disposing of the priming material.


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