The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2022
Filed:
Apr. 15, 2020
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Chien-Hung Lai, Taichung, TW;
Hao-Ming Chang, Pingtung, TW;
Chia-Shih Lin, Hsinchu, TW;
Hsuan-Wen Wang, Kaohsiung, TW;
Yu-Hsin Hsu, Taichung, TW;
Chih-Tsung Shih, Hsinchu, TW;
Yu-Hsun Wu, New Taipei, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.