The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2022
Filed:
Dec. 15, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Herng Yau Yoong, Singapore, SG;
Wen Xiao, Singapore, SG;
Ribhu Gautam, Singapore, SG;
Sanjay Bhat, Singapore, SG;
Vibhu Jindal, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G03F 1/60 (2012.01); G03F 1/44 (2012.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 1/60 (2013.01); G03F 1/44 (2013.01);
Abstract
Apparatus and methods to improve centroid wavelength uniformity of EUV mask blanks are disclosed. The apparatus and methods may utilize one or more of heating the backside and/or the front side of the EUV mask blank. Selected regions and sub regions of the EUV mask blank are selectively heated, resulting in improved centroid wavelength uniformity of EUV mask blanks.