The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Nov. 28, 2017
Applicant:

Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);

Inventors:

Edward Deneen Hanzlik, Shorewood, MN (US);

Michael W. Gruenhagen, Norwood Young America, MN (US);

Tim W. Herbst, Minneapolis, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 7/0092 (2013.01); H01L 21/02052 (2013.01); H01L 21/6719 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01); H01L 21/68785 (2013.01);
Abstract

Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.


Find Patent Forward Citations

Loading…