The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2022
Filed:
Apr. 25, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Tapashree Roy, Bangalore, IN;
Rutger Meyer Timmerman Thijssen, San Jose, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Jinxin Fu, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 16/40 (2006.01); C23C 16/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/0227 (2013.01); C23C 16/045 (2013.01); C23C 16/405 (2013.01);
Abstract
A method for creating a flat optical structure is disclosed, having steps of providing a substrate, etching at least one nanotrench in the substrate, placing a dielectric material in the at least one nanotrench in the substrate and encapsulating a top of the substrate with a film.
Quick Actions:
Roy, Tapashree. (2022). Method for creating a dielectric filled nanostructured silica substrate for flat optical devices (U.S. Patent No. 11473191). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11473191
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile