The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Jun. 05, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Wen Xiao, Singapore, SG;
Vibhu Jindal, San Jose, CA (US);
Huajun Liu, Singapore, SG;
Herng Yau Yoong, Singapore, SG;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/41 (2006.01); G03F 7/20 (2006.01); G03F 1/22 (2012.01); G03F 1/54 (2012.01); G03F 1/26 (2012.01); G01J 1/42 (2006.01); G01N 21/33 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70133 (2013.01); G01J 1/42 (2013.01); G01N 21/33 (2013.01); G01N 21/41 (2013.01); G03F 1/22 (2013.01); G03F 1/26 (2013.01); G03F 1/54 (2013.01); G03F 7/7015 (2013.01);
Abstract
Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of EUV wavelengths and thickness values for the absorber material to determine the refractive index of the absorber material.