The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Apr. 06, 2018
Applicants:

Wayne State University, Detroit, MI (US);

Universitat Zurich, Zurich, CH;

Inventors:

David Crich, Detroit, MI (US);

Girish Sati, Detroit, MI (US);

Amr Sonousi, Detroit, MI (US);

Guanyu Yang, Detroit, MI (US);

Appi Reddy Mandhapati, Detroit, MI (US);

Michael G. Pirrone, Detroit, MI (US);

Takayuki Kato, Detroit, MI (US);

Vikram Sarpe, Detroit, MI (US);

Andrea Vasella, Zurich, CH;

Erik C. Bottger, Zurich, CH;

Sven N. Hobbie, Zurich, CH;

Assignees:

WAYNE STATE UNIVERSITY, Detroit, MI (US);

UNIVERSITAT ZURICH, Zurich, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07H 15/232 (2006.01); C07H 15/224 (2006.01); A61P 31/04 (2006.01); C07H 19/01 (2006.01);
U.S. Cl.
CPC ...
C07H 15/232 (2013.01); A61P 31/04 (2018.01); C07H 15/224 (2013.01); C07H 19/01 (2013.01);
Abstract

The present disclosure relates to derivatives of neamine-based aminoglycoside antibacterial drugs modified in position C6', C2′ and/or C5″. The modifications impart favorable properties regarding activity against ESKAPE pathogens, evasion of resistance traits and increased selectivity, enabling systemic use of the compounds.


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