The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

Nov. 25, 2020
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Kevin W. Brew, Niskayuna, NY (US);

Injo Ok, Loudonville, NY (US);

Iqbal Rashid Saraf, Glenmont, NY (US);

Nicole Saulnier, Slingerlands, NY (US);

Matthew Joseph BrightSky, Armonk, NY (US);

Robert L. Bruce, White Plains, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1273 (2013.01); H01L 27/2463 (2013.01); H01L 45/06 (2013.01); H01L 45/1233 (2013.01); H01L 45/16 (2013.01);
Abstract

A mushroom type phase change memory (PCM) cell includes a projection liner located between a PCM volume and a bottom electrode. The projection liner has been retained from a layer previously utilized as an etch stop layer during the fabrication of PCM cell and/or the fabrication of the higher level IC device. The projection liner may extend beyond the PCM sidewall(s) or side boundary. This section of the projection liner may be located or buried under a dielectric or an encapsulation spacer and may increase thickness uniformity of the projection liner below the PCM volume.


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