The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

May. 11, 2020
Applicants:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Tsmc Nanjing Company Limited, Nanjing, CN;

Tsmc China Company Limited, Shanghai, CN;

Inventors:

Xin-Yong Wang, Shanghai, CN;

Yang Zhou, Nanjing, CN;

Liu Han, Nanjing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 27/02 (2006.01); G06F 30/392 (2020.01); H01L 21/28 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); G06F 30/392 (2020.01); H01L 21/28123 (2013.01); H01L 21/823814 (2013.01); H01L 21/823821 (2013.01); H01L 21/823828 (2013.01); H01L 27/0924 (2013.01); H01L 29/0653 (2013.01); H01L 29/0847 (2013.01); H01L 29/66545 (2013.01); G06F 2119/18 (2020.01);
Abstract

A semiconductor device includes a substrate, a first gate structure, a second gate structure, a third gate structure, and a first source/drain region. The first, second, and third gate structures are above the substrate and arranged in a first direction. The first, second, and third gate structures extend in a second direction different from the first direction, and the second gate structure is between the first and third gate structures. The first source/drain region is between the first and third gate structures, and the first source/drain region is at one end of the second gate structure.


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