The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Jun. 05, 2020
Applicant:
Gigaphoton Inc., Tochigi, JP;
Inventors:
Kouichiro Kouge, Oyama, JP;
Yusuke Hoshino, Oyama, JP;
Toshihiro Nishisaka, Oyama, JP;
Takashi Okada, Oyama, JP;
Assignee:
Gigaphoton Inc., Tochigi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/006 (2013.01); G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/70041 (2013.01); G03F 7/70808 (2013.01); G03F 7/70858 (2013.01); H05G 2/008 (2013.01);
Abstract
An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
Quick Actions:
Kouge, Kouichiro. (2022). Euv chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method (U.S. Patent No. 11452196). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11452196
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile