The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Mar. 22, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Narjes Javaheri, Eindhoven, NL;
Mohammadreza Hajiahmadi, Rotterdam, NL;
Olger Victor Zwier, Nuenen, NL;
Gonzalo Roberto Sanguinetti, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01M 11/02 (2006.01); G01M 11/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G01M 11/00 (2013.01); G01M 11/0264 (2013.01); G03F 7/705 (2013.01); G03F 7/70633 (2013.01);
Abstract
A method of determining a patterning process parameter from a metrology target, the method including: obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target; and using the combination of values to determine a same value of the patterning process parameter for the target.