The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Nov. 20, 2018
Asml Netherlands B.v., Veldhoven, NL;
Manouk Rijpstra, Eindhoven, NL;
Cornelis Johannes Henricus Lambregts, Geldrop, NL;
Wim Tjibbo Tel, Helmond, NL;
Sarathi Roy, Eindhoven, NL;
Cédric Désiré Grouwstra, Eindhoven, NL;
Chi-Fei Nien, Veldhoven, NL;
Weitian Kou, Eindhoven, NL;
Chang-Wei Chen, Taipei, TW;
Pieter Gerardus Jacobus Smorenberg, Rotterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.