The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Mar. 01, 2018
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Nazila Dadvand, Richardson, TX (US);

Keith Edward Johnson, Garland, TX (US);

Christopher Daniel Manack, Flower Mound, TX (US);

Salvatore Frank Pavone, Murphy, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/31 (2006.01); H01L 23/498 (2006.01); H01L 23/538 (2006.01); H01L 25/065 (2006.01); H01L 23/00 (2006.01); H01L 21/56 (2006.01);
U.S. Cl.
CPC ...
H01L 23/3128 (2013.01); H01L 21/561 (2013.01); H01L 23/3114 (2013.01); H01L 23/49811 (2013.01); H01L 23/5384 (2013.01); H01L 23/5389 (2013.01); H01L 24/11 (2013.01); H01L 24/13 (2013.01); H01L 24/17 (2013.01); H01L 24/19 (2013.01); H01L 24/82 (2013.01); H01L 25/0657 (2013.01); H01L 2224/94 (2013.01); H01L 2924/15313 (2013.01);
Abstract

A method for fabricating a copper pillar. The method includes forming a layer of titanium tungsten (TiW) over a semiconductor wafer, forming a layer of zinc (Zn) over the layer of TiW, and forming a copper pillar over the via. In addition, the method includes performing an anneal to diffuse the layer of Zn into the copper pillar. A semiconductor device that includes a layer of TiW coupled to a via of a semiconductor wafer and a copper pillar coupled to the layer of TiW. The copper pillar has interdiffused Zn within its bottom portion. Another method for fabricating a copper pillar includes forming a layer of TiW over a semiconductor wafer, forming a first patterned photoresist, forming a layer of Zn, and then removing the first patterned photoresist. The method further includes forming a second patterned photoresist and forming a copper pillar.


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