The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Dec. 28, 2020
Applied Materials Israel Ltd., Rehovot, IL;
Roman Kris, Jerusalem, IL;
Grigory Klebanov, Rishon-LeZion, IL;
Einat Frishman, Rehovot, IL;
Tal Orenstein, Rehovot, IL;
Meir Vengrover, Gedera, IL;
Noa Marom, Karmei Katif, IL;
Ilan Ben-Harush, Tel Aviv, IL;
Rafael Bistritzer, Petach Tikva, IL;
Sharon Duvdevani-Bar, Mazkeret-Batya, IL;
Applied Materials Israel Ltd., Rehovot, IL;
Abstract
There is provided a system and method of generating a metrology recipe usable for examining a semiconductor specimen, comprising: obtaining a first image set comprising a plurality of first images captured by an examination tool, obtaining a second image set comprising a plurality of second images, wherein each second image is simulated based on at least one first image, wherein each second image is associated with ground truth data; performing a first test on the first image set and a second test on the second image set in accordance with a metrology recipe configured with a first parameter set, and determining, in response to a predetermined criterion not being met, to select a second parameter set, configure the metrology recipe with the second parameter set, and repeat the first test and the second test in accordance with the metrology recipe configured with the second parameter set.