The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Aug. 30, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yu-Jen Chen, Tainan, TW;

Ling-Sung Wang, Tainan, TW;

I-Shan Huang, Tainan, TW;

Chan-yu Hung, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/392 (2020.01); H01L 27/088 (2006.01); H01L 27/02 (2006.01); G03F 1/70 (2012.01); G03F 1/36 (2012.01); H01L 27/092 (2006.01); G06F 30/39 (2020.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 21/8238 (2006.01); H01L 21/027 (2006.01); H01L 21/8234 (2006.01); G06F 30/398 (2020.01); H01L 27/11 (2006.01); G06F 119/18 (2020.01); G06F 111/20 (2020.01); G03F 1/30 (2012.01); G03F 1/32 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G06F 30/39 (2020.01); G06F 30/398 (2020.01); H01L 21/28123 (2013.01); H01L 27/0207 (2013.01); H01L 27/0886 (2013.01); H01L 27/092 (2013.01); H01L 29/4238 (2013.01); G03F 1/30 (2013.01); G03F 1/32 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01); G06F 2111/20 (2020.01); G06F 2119/18 (2020.01); H01L 21/0274 (2013.01); H01L 21/823431 (2013.01); H01L 21/823437 (2013.01); H01L 21/823821 (2013.01); H01L 21/823828 (2013.01); H01L 27/0924 (2013.01); H01L 27/1104 (2013.01);
Abstract

The semiconductor structure includes first and second active regions arranged in a first grid oriented in a first direction. The semiconductor structure further includes gate electrodes arranged spaced apart in a second grid and on corresponding ones of the active regions, the second grid being oriented in a second direction, the second direction being substantially perpendicular to the first direction. The first and second active regions are separated, relative to the second direction, by a gap. Each gate electrode includes a first segment and a gate extension. Each gate extension extends, relative to the second direction, beyond the corresponding active region and into the gap by a height H, where H≤150 nanometers (nm). Each gate extension, relative to a plane defined by the first and second directions, is substantially rectangular.


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