The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2022

Filed:

Nov. 27, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kazuki Motomatsu, Koshi, JP;

Satoshi Kaneko, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/16 (2006.01); B05B 13/02 (2006.01); B05C 5/00 (2006.01); C23C 18/31 (2006.01); B05C 13/00 (2006.01);
U.S. Cl.
CPC ...
C23C 18/168 (2013.01); B05B 13/02 (2013.01); B05C 5/001 (2013.01); B05C 13/00 (2013.01); C23C 18/1628 (2013.01); C23C 18/1642 (2013.01); C23C 18/31 (2013.01);
Abstract

A substrate liquid processing apparatus configured to perform a heating control over a processing liquid on a substrate with high accuracy in a unit of zones is provided. The substrate liquid processing apparatus includes a substrate holder configured to hold the substrate; a processing liquid supply configured to supply the processing liquid onto a processing surface of the substrate; and a heating unit configured to heat the processing liquid on the processing surface. The heating unit includes a heater, and a first sheet-shaped body and a second sheet-shaped body which are disposed to face the heater therebetween. The heater includes multiple heating elements provided in multiple heating zones of the heating unit.


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