The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Mar. 12, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Wei-An Lai, Taichung, TW;

Wei-Cheng Lin, Taichung, TW;

Yan-Hao Chen, Hsinchu, TW;

Jiann-Tyng Tzeng, Hsinchu, TW;

Lipen Yuan, Zhubei, TW;

Hui-Zhong Zhuang, Kaohsiung, TW;

Yu-Xuan Huang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/00 (2020.01); G06F 30/392 (2020.01); G06F 111/20 (2020.01); G06F 111/14 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 2111/14 (2020.01); G06F 2111/20 (2020.01);
Abstract

One aspect of this description relates to a method for operating an integrated circuit (IC) manufacturing system. The method includes placing a first nano-sheet structure within a IC layout diagram. The first nano-sheet structure has a first width. The method includes abutting a second nano-sheet structure with the first nano-sheet structure. The second nano-sheet structure has a second width. The second width is less than the first width. The method includes generating and storing the IC layout diagram in a storage device.


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