The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2022
Filed:
Mar. 01, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Shinya Nishimoto, Yamanashi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); C23C 16/505 (2006.01); C23C 16/511 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45536 (2013.01); C23C 16/505 (2013.01); C23C 16/511 (2013.01); H01J 37/3222 (2013.01); H01J 37/32192 (2013.01); H01J 37/32522 (2013.01);
Abstract
In a plasma processing apparatus for generating a plasma in a processing space of a processing chamber and performing plasma processing on a target object, the apparatus includes an antenna configured to radiate a microwave for plasma generation into the processing chamber through a ceiling plate. The plasma processing apparatus further includes a pressing mechanism provided above the antenna and configured to press the antenna against the ceiling plate by a pressure of fluid supplied thereinto.