The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Dec. 31, 2019
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Farrell M. Good, Meridian, ID (US);

Robert K. Grubbs, Boise, ID (US);

Gurpreet S. Lugani, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1675 (2013.01); H01L 45/1233 (2013.01); H01L 45/141 (2013.01);
Abstract

Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.


Find Patent Forward Citations

Good, Farrell. (2022). Protective sealant for chalcogenide material and methods for forming the same (U.S. Patent No. 11417840). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11417840

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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