The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2022
Filed:
Mar. 11, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Yuichiro Wagatsuma, Nirasaki, JP;
Toyohiro Kamada, Hillsboro, OR (US);
Shinichi Ike, Nirasaki, JP;
Shuji Azumo, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); C23C 16/36 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02126 (2013.01); C23C 16/36 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01L 21/0234 (2013.01); H01L 21/02167 (2013.01); H01L 21/02326 (2013.01);
Abstract
There is provided a film forming method, including: forming a film containing silicon, carbon and nitrogen on a substrate in a first process; and oxidizing the film with an oxidizing agent containing a hydroxy group and subsequently supplying a nitriding gas to the substrate in a second process.