The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Mar. 26, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hideaki Yamasaki, Nirasaki, JP;

Tomonari Urano, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); H01L 21/285 (2006.01); H01L 21/768 (2006.01); C23C 16/08 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); C23C 16/08 (2013.01); C23C 16/4581 (2013.01); C23C 16/4586 (2013.01); C23C 16/45557 (2013.01); C23C 16/56 (2013.01); H01L 21/28562 (2013.01); H01L 21/76843 (2013.01);
Abstract

There is provided a substrate processing apparatus which includes: a substrate mounting table installed in a vacuum vessel; a gas supply part configured to supply a processing gas into the vacuum vessel; a vacuum-exhausting part configured to exhaust the interior of the vacuum vessel; an elevating member configured to lift up and down a substrate while holding the substrate mounted on the mounting table; and a control part configured to output a control signal to execute a first step of supplying the processing gas onto the substrate and setting an internal pressure of the vacuum vessel to a first pressure, a second step of changing the internal pressure to a second pressure lower than the first pressure, and a third step of lifting up the substrate from the mounting table after the first step and before the second step or in parallel with the second step.


Find Patent Forward Citations

Loading…