The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Dec. 30, 2019
Micron Technology, Inc., Boise, ID (US);
Santanu Sarkar, Boise, ID (US);
Jerome A. Imonigie, Boise, ID (US);
Kent H. Zhuang, Boise, ID (US);
Josiah Jebaraj Johnley Muthuraj, Meridian, ID (US);
Janos Fucsko, Boise, ID (US);
Benjamin E. Greenwood, Boise, ID (US);
Farrell M. Good, Meridian, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Systems, apparatuses, and methods related to semiconductor structure formation are described. An example apparatus includes a structural material for a semiconductor device. The structural material includes an orthosilicate derived oligomer having a number of oxygen (O) atoms each chemically bonded to one of a corresponding number of silicon (Si) atoms and a chemical bond formed between an element from group 13 of a periodic table of elements (e.g., B, Al, Ga, In, and Tl) and the number of O atoms of the orthosilicate derived oligomer. The chemical bond crosslinks chains of the orthosilicate derived oligomer to increase mechanical strength of the structural material, relative to the structural material formed without the chemical bond to crosslink the chains, among other benefits described herein.