The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2022
Filed:
Jun. 23, 2020
Applicant:
Winbond Electronics Corp., Taichung, TW;
Inventors:
Assignee:
WINBOND ELECTRONICS CORP., Taichung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 29/66 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28097 (2013.01); H01L 21/28176 (2013.01); H01L 21/823443 (2013.01); H01L 21/823468 (2013.01); H01L 29/665 (2013.01); H01L 29/6653 (2013.01); H01L 29/6656 (2013.01);
Abstract
A method for forming a semiconductor structure includes forming a gate electrode layer over a semiconductor substrate, forming a first spacer layer to cover a sidewall of the gate electrode layer, recessing the first spacer layer to expose an upper portion of the sidewall of the gate electrode layer, forming a metal material to cover an upper surface and the upper portion of the sidewall of the gate electrode layer; reacting a semiconductor material of the gate electrode layer with the metal material using an anneal process to form a silicide layer, and removing the metal material after the anneal process.