The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Jan. 06, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Yogananda Sarode Vishwanath, Bangalore, IN;
Sunil Srinivasan, Milpitas, CA (US);
Rajinder Dhindsa, Pleasanton, CA (US);
Steven E. Babayan, Los Altos, CA (US);
Olivier Luere, Sunnyvale, CA (US);
Denis M. Koosau, Pleasanton, CA (US);
Imad Yousif, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatuses including a height-adjustable edge ring, and methods for use thereof are described herein. In one example, a substrate support assembly includes a height-adjustable edge ring, and the substrate support assembly is located within a process chamber. The substrate support assembly includes an electrostatic chuck, an edge ring positioned on a portion of the electrostatic chuck, and one or more actuators to adjust the height of the edge ring via one or more push pins. The height-adjustable edge ring can be used to compensate for erosion of the edge ring over time. In addition, the height-adjustable edge ring can be removed from the process chamber via a slit valve opening without venting and opening the process chamber. The height-adjustable edge ring can be tilted by the one or more actuators in order to improve azimuthal uniformity at the edge of the substrate.