The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2022

Filed:

May. 25, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Chen-Fang Chung, Zhubei, TW;

Wen-Cheng Cheng, Hsinchu, TW;

Tsez-Chong Tsai, Hsinchu, TW;

Shuen-Liang Tseng, Hsinchu, TW;

Szu-Hsien Lo, Hinchu, TW;

Po-Wen Yang, Hsinchu, TW;

Ming-Jie He, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); B81C 1/00 (2006.01); H01L 21/02 (2006.01); B81B 3/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/0092 (2013.01); B81B 3/0005 (2013.01); B81C 1/0096 (2013.01); B81C 1/00349 (2013.01); B81C 1/00357 (2013.01); B81C 1/00373 (2013.01); B81C 1/00682 (2013.01); B81C 1/00912 (2013.01); B81C 1/00928 (2013.01); B81C 1/00992 (2013.01); H01J 37/3405 (2013.01); H01J 37/347 (2013.01); H01J 37/3414 (2013.01); H01J 37/3461 (2013.01); H01L 21/02499 (2013.01); H01L 21/02518 (2013.01); B81B 2201/025 (2013.01); B81B 2201/0235 (2013.01); B81B 2201/0242 (2013.01); B81B 2207/012 (2013.01); B81C 2201/0133 (2013.01); B81C 2201/112 (2013.01); B81C 2203/0118 (2013.01); B81C 2203/035 (2013.01);
Abstract

In an embodiment, a system includes: a chamber; and a magnetic assembly contained within the chamber. The magnetic assembly comprises: an inner magnetic portion comprising first magnets; and an outer magnetic portion comprising second magnets. At least two adjacent magnets, of either the first magnets or the second magnets, have different vertical displacements, and the magnetic assembly is configured to rotate around an axis to generate an electromagnetic field that moves ions toward a target region within the chamber.


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