The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2022

Filed:

Jun. 15, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Jheng-Sheng You, Hsinchu County, TW;

Hsin-Chih Lin, Hsinchu, TW;

Kun-Ming Huang, Taipei, TW;

Lieh-Chuan Chen, Hsinchu, TW;

Po-Tao Chu, New Taipei, TW;

Shen-Ping Wang, Keelung, TW;

Chien-Li Kuo, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/45 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/417 (2006.01); H01L 29/10 (2006.01); H01L 29/40 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66462 (2013.01); H01L 29/452 (2013.01); H01L 29/7786 (2013.01); H01L 29/1066 (2013.01); H01L 29/402 (2013.01); H01L 29/41758 (2013.01);
Abstract

A high electron mobility transistor (HEMT) includes a first III-V compound layer, a second III-V compound layer over the first III-V compound layer, source and drain structures over the second III-V compound layer and spaced apart from each other, a gate structure over the second III-V compound layer and between the source and drain structures, a gate field plate over the second III-V compound layer and between the gate structure and the drain structure, and an etch stop layer over the drain structure and spaced apart from the gate field plate.


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