The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Mar. 10, 2020
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Abstract
Various embodiments of the present application are directed towards a semiconductor device comprising a trench capacitor, the trench capacitor comprising a plurality of lateral protrusions. In some embodiments, the trench capacitor comprises a dielectric structure over a substrate. The dielectric structure may comprise a plurality of dielectric layers overlying the substrate. The dielectric structure may comprise a plurality of lateral recesses. In some embodiments, the plurality of lateral protrusions extend toward and fill the plurality of lateral recesses. By forming the trench capacitor with the plurality of lateral protrusions filling the plurality of lateral recesses, the surface area of the capacitor is increased without increasing the depth of the trench. As a result, greater capacitance values may be achieved without necessarily increasing the depth of the trench and thus, without necessarily increasing the size of the semiconductor device.