The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Apr. 26, 2019
Unimicron Technology Corp., Taoyuan, TW;
Pu-Ju Lin, Hsinchu, TW;
Shih-Lian Cheng, New Taipei, TW;
Yu-Hua Chen, Hsinchu, TW;
Cheng-Ta Ko, Taipei, TW;
Jui-Jung Chien, Hsinchu County, TW;
Wei-Tse Ho, Taichung, TW;
Unimicron Technology Corp., Taoyuan, TW;
Abstract
A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.