The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Sep. 20, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yi-Hsien Chang, Shetou Township, TW;

Chun-Ren Cheng, Hsinchu, TW;

Shih-Wei Lin, Taipei, TW;

Yi-Shao Liu, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/414 (2006.01); H01L 21/8234 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01); H01L 21/3213 (2006.01); H01L 27/28 (2006.01);
U.S. Cl.
CPC ...
G01N 27/4145 (2013.01); H01L 21/28525 (2013.01); H01L 21/31111 (2013.01); H01L 21/32135 (2013.01); H01L 21/7684 (2013.01); H01L 21/76877 (2013.01); H01L 21/823437 (2013.01); H01L 21/823475 (2013.01); H01L 27/283 (2013.01);
Abstract

The present disclosure provides a biological field effect transistor (BioFET) and a method of fabricating a BioFET device. The method includes forming a BioFET using one or more process steps compatible with or typical to a complementary metal-oxide-semiconductor (CMOS) process. The BioFET device includes a plurality of micro wells having a sensing gate bottom and a number of stacked well portions. A bottom surface area of a well portion is different from a top surface area of a well portion directly below. The micro wells are formed by multiple etching operations through different materials, including a sacrificial plug, to expose the sensing gate without plasma induced damage.


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