The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2022

Filed:

Jul. 05, 2018
Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Shunsuke Moriya, Toyama, JP;

Tomoyuki Enomoto, Toyama, JP;

Tetsuya Shinjo, Toyama, JP;

Hiroshi Ogino, Toyama, JP;

Kazuhiro Sawada, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09J 183/04 (2006.01); C08G 77/00 (2006.01); C09J 5/06 (2006.01); H01L 21/304 (2006.01); H01L 21/683 (2006.01); C09J 4/00 (2006.01); B29C 71/02 (2006.01); C08G 77/08 (2006.01);
U.S. Cl.
CPC ...
C09J 183/04 (2013.01); C08G 77/70 (2013.01); C08G 77/80 (2013.01); C08J 7/08 (2013.01); C09J 4/00 (2013.01); C09J 5/06 (2013.01); H01L 21/304 (2013.01); H01L 21/6836 (2013.01); C08G 77/08 (2013.01); C09J 2203/326 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68327 (2013.01);
Abstract

An adhesive for separatably attaching a support to a circuit side of a wafer to process a rear surface of the wafer, the adhesive including a component (A) that is cured by a hydrosilylation reaction and a component (B) containing a phenyl group-containing polyorganosiloxane, wherein a ratio in % by mass of the component (A) to the component (B) is 95:5 to 30:70. A separation method including applying the adhesive onto a first body to form an adhesion layer, attaching a second body to the adhesion layer, heating the adhesion layer from a side of the first body to cure the adhesive to form a layered body, processing the layered body, and carrying out separation between the adhesion layer, and the first and second bodies. The processing may be polishing the rear surface of the wafer.


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